The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Dec. 15, 2014
Tokyo Electron Limited, Tokyo, JP;
Osaka University, Suita-shi, Osaka, JP;
Seiji Nagahara, Tokyo, JP;
Gousuke Shiraishi, Koshi, JP;
Satoru Shimura, Koshi, JP;
Kousuke Yoshihara, Koshi, JP;
Shinichiro Kawakami, Koshi, JP;
Masaru Tomono, Koshi, JP;
Seiichi Tagawa, Suita, JP;
Akihiro Oshima, Suita, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
OSAKA UNIVERSITY, Osaka, JP;
Abstract
A substrate treatment system for treating a substrate, includes: a treatment station in which a plurality of treatment apparatuses which treat the substrate are provided; an interface station which directly or indirectly delivers the substrate between an exposure apparatus which is provided outside the substrate treatment system and performs exposure of patterns on a resist film on the substrate, and the substrate treatment system; a light irradiation apparatus which performs post-exposure using UV light on the resist film on the substrate after the exposure of patterns is performed; and a post-exposure station which houses the light irradiation apparatus and is adjustable to a reduced pressure or inert gas atmosphere, wherein the post-exposure station is connected to the exposure apparatus directly or indirectly via a space which is adjustable to a reduced pressure or inert gas atmosphere.