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For the Inventor, By the Inventor

Tokyo, Japan

Seiji Nagahara

USPTO Granted Patents = 25 

 

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 75(Granted Patents)


Location History:

  • Kawasaki, JP (2008 - 2009)
  • Sagamihara Kanagawa, JP (2019)
  • Sagamihara, JP (2016 - 2020)
  • Kanagawa, JP (2007 - 2021)
  • Tokyo, JP (2004 - 2022)

Company Filing History:

goldMedal18 out of 10,341 
 
Tokyo Electron Limited
 patents
silverMedal6 out of 2,467 
 
Nec Electronics Corporation
 patents
bronzeMedal6 out of 989 
 
Osaka University
 patents
4. 3 out of 1,058 
 
Jsr Corporation
 patents
5. 2 out of 5,978 
 
Shin-etsu Chemical Co., Ltd.
 patents
6. 1 out of 7,529 
 
Renesas Electronics Corporation
 patents
7. 1 out of 4 
 
Lintfield Limited
 patents
where one patent can have more than one assignee

Years Active: 2004-2025

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25 patents (USPTO):Explore Patents
1. 12398152 - Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said composition (2025-08-26),
2. 11353793 - Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium (2022-06-07),
3. 11163236 - Method and process for stochastic driven detectivity healing (2021-11-02),
4. 11061332 - Methods for sensitizing photoresist using flood exposures (2021-07-13),
5. 10747121 - Optical processing apparatus and substrate processing apparatus (2020-08-18),
6. 10558125 - Exposure apparatus, exposure apparatus adjustment method and storage medium (2020-02-11),
7. 10534266 - Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes (2020-01-14),
8. 10527948 - Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium (2020-01-07),
9. 10429745 - Photo-sensitized chemically amplified resist (PS-CAR) simulation (2019-10-01),
10. 10274843 - Exposure apparatus, exposure method and storage medium (2019-04-30),
11. 10101669 - Exposure apparatus, resist pattern forming method, and storage medium (2018-10-16),
12. 10073349 - Chemically amplified resist material, pattern-forming method, compound, and production method of compound (2018-09-11),
13. 10073348 - Resist-pattern-forming method and chemically amplified resist material (2018-09-11),
14. 10025190 - Substrate treatment system (2018-07-17),
15. 10025187 - Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting (2018-07-17),

Title: The Innovative Mind of Seiji Nagahara

Introduction: Seiji Nagahara is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Seiji Nagahara holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Seiji Nagahara has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Seiji Nagahara has collaborated with top researchers, engineers, and scientists both in Japan and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Seiji Nagahara's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor in the global tech community, with his work continuing to inspire future generations of inventors and innovators.

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