The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
Feb. 13, 2009
Applicants:
Hidetami Yaegashi, Yamanashi, JP;
Satoru Shimura, Yamanashi, JP;
Takashi Hayakawa, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern forming method for forming a pattern serving as a mask, includes a process for forming a first pattern, a process for trimming a width of the first pattern, a process for forming a boundary layeron a surface of the first pattern, a process for forming a second mask material layeron a surface of the boundary layer, a process for removing a part of the second mask material layerto expose top portions of the boundary layer, and a process for exposing the first patternand forming a second pattern having the second mask material layerat a top portion thereof by etching the boundary layer