The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Feb. 11, 2016
Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Miyako Kaneko, Nirasaki, JP;

Takehiko Orii, Nirasaki, JP;

Satoru Shimura, Nirasaki, JP;

Masami Yamashita, Koshi, JP;

Itaru Kanno, Minato-ku, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); B08B 3/08 (2013.01); H01L 21/02041 (2013.01); H01L 21/02057 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01);
Abstract

A method for cleaning a substrate includes setting a substrate inside a cleaning chamber, supplying on a surface of the substrate a treatment solution which includes a volatile component and forms a treatment film, vaporizing the volatile component of the treatment solution supplied on the surface of the substrate such that the treatment solution solidifies or is cured on the surface of the substrate and the treatment film is formed on the surface of the substrate, and supplying onto the treatment film formed on the surface of the substrate a removal solution which removes the treatment film.


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