The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2018

Filed:

Nov. 12, 2014
Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Miyako Kaneko, Nirasaki, JP;

Keiji Tanouchi, Nirasaki, JP;

Takehiko Orii, Nirasaki, JP;

Itaru Kanno, Minato-ku, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, Tokyo, unknown;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); H01L 21/02 (2006.01); B08B 7/00 (2006.01); C11D 11/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02041 (2013.01); B08B 7/0014 (2013.01); C11D 11/0047 (2013.01); H01L 21/67051 (2013.01);
Abstract

A method for cleaning a substrate, includes supplying to a substrate having a hydrophilic surface a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the hydrophilic surface of the substrate, and supplying to the substrate having the processing film a strip-processing liquid for stripping the processing film from the substrate.


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