The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Oct. 14, 2015
Tokyo Electron Limited, Tokyo, JP;
Hiroki Ohno, Kumamoto, JP;
Keiji Tanouchi, Yamanashi, JP;
Kazuyuki Mitsuoka, Kumamoto, JP;
Takehiko Orii, Yamanashi, JP;
Takayuki Toshima, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a substrate processing method. The method includes: supplying a rinse liquid, IPA, a first fluorine-containing organic solvent, a second fluorine-containing organic solvent to a wafer within an outer chamber of a liquid processing unit; conveying the wafer to a supercritical processing unit container; and supplying a supercritical processing fluorine-containing organic solvent in a supercritical high-pressure fluid state to the wafer within the supercritical processing unit container. At least during the supply of the IPA, a low-humidity Ngas is supplied into the outer chamber so that the inside of the outer chamber is formed as a low-humidity Ngas atmosphere, and thus moisture absorption into the IPA is prevented.