Location History:
- Tokyo-To, JP (2003)
- Machida, JP (2003 - 2005)
- Minato-Ku, JP (2010)
- Nirasaki, JP (1998 - 2019)
- Yamanashi, JP (2014 - 2019)
- Kumamoto, JP (2000 - 2021)
- Tokyo, JP (2011 - 2021)
Company Filing History:
33 out of 10,295 
2 out of 52,711 
2 out of 2,955 
Years Active: 1998-2025
Title: Hiroki Ohno: Innovator in Substrate Cleaning Technologies
Introduction: Hiroki Ohno, an accomplished inventor based in Nirasaki, Japan, boasts an impressive portfolio of 36 patents. His innovative work primarily focuses on methods and devices that enhance substrate cleaning processes, which are crucial in various technological applications.
Latest Patents: Among his latest contributions to the field are two significant patents. The first, titled "Substrate Cleaning Method and Substrate Cleaning Device," details a process involving a gas mixture designed to efficiently remove particles adhering to substrates. The method utilizes a cluster forming gas and a carrier gas, optimizing the cleaning process through careful gas mixture injection and management. The second patent, "Method of Cleaning Substrate Processing Apparatus and System of Cleaning Substrate Processing Apparatus," describes an innovative approach to cleaning substrate processing equipment. This method employs a supercritical fluid and isopropyl alcohol to facilitate drying and cleaning, ensuring high standards of cleanliness in substrate processing.
Career Highlights: Hiroki Ohno has made substantial contributions during his tenure at notable companies, including Tokyo Electron Limited and Toshiba Memory Corporation. His work in these leading technology firms has undoubtedly influenced advancements in substrate cleaning technologies, making strides in efficiency and effectiveness.
Collaborations: Throughout his career, Ohno has collaborated with distinguished colleagues, including Takehiko Orii and Takayuki Toshima. These partnerships have fostered an environment of innovation, leading to the development of groundbreaking technologies that push the boundaries of substrate cleaning.
Conclusion: Hiroki Ohno stands out as a pivotal figure in the realm of substrate cleaning innovation. With a robust portfolio of patents and a career marked by impactful collaborations, he continues to drive advancements that contribute significantly to technological progress in substrate processing. His work exemplifies the creative spirit of inventors dedicated to solving complex challenges in modern industries.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.