The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Nov. 02, 2017
Tokyo Electron Limited, Tokyo, JP;
Gentaro Goshi, Kumamoto, JP;
Keisuke Egashira, Kumamoto, JP;
Yosuke Kawabuchi, Kumamoto, JP;
Hiromi Kiyose, Kumamoto, JP;
Takuro Masuzumi, Kumamoto, JP;
Hiroki Ohno, Kumamoto, JP;
Kento Tsukano, Kumamoto, JP;
Hiroshi Marumoto, Kumamoto, JP;
Shotaro Kitayama, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus performs: a pressure raising process of raising a pressure within the processing container to a processing pressure higher than a critical pressure of the processing fluid, after the substrate is accommodated in the processing container; and a circulation process of supplying the processing fluid to the processing container and discharging the processing fluid from the processing container while keeping a pressure at which the processing fluid is maintained in the supercritical state, within the processing container. In the pressure raising process, the supply of the processing fluid from the second fluid supply unit is stopped and the processing fluid is supplied from the first fluid supply unit into the processing container until at least the pressure within the processing container reaches the critical pressure. In the circulation process, the processing fluid is supplied into the processing container from the second fluid supply unit.