Kumamoto, Japan

Gentaro Goshi

USPTO Granted Patents = 25 

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 40(Granted Patents)


Location History:

  • Tosu, JP (2007)
  • Phoenix, AZ (US) (2007)
  • Phoeniz, AZ (US) (2009)
  • Kumamoto, JP (2017 - 2023)
  • Koshi, JP (2020 - 2024)

Company Filing History:


Years Active: 2007-2025

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25 patents (USPTO):Explore Patents

Title: Innovations by Gentaro Goshi in Substrate Processing

Introduction

Gentaro Goshi, an esteemed inventor based in Kumamoto, Japan, has made significant contributions to the field of substrate processing technology. With a prolific portfolio comprising 24 patents, Goshi's innovations have paved the way for advancements in processing methods and apparatuses, primarily in the semiconductor industry.

Latest Patents

Among his latest inventions, Goshi has developed a substrate processing method and a substrate processing system that enhance the efficiency of surface treatment processes. The substrate processing method involves a series of steps to remove dissolved gases from a processing liquid and form a liquid film covering the substrate's surface. The method includes the drying of the substrate by introducing a processing fluid in a supercritical state, effectively replacing the processing liquid with the processing fluid through vaporization.

His other inventive work includes a substrate liquid processing apparatus that features a substrate holding unit designed to secure the substrate while allowing a processing liquid to be dispensed from an outer nozzle. This nozzle discharges the processing liquid to create a liquid film across the substrate's surface, demonstrating Goshi's commitment to enhancing substrate processing efficiency.

Career Highlights

Gentaro Goshi is currently associated with Tokyo Electron Limited, a leader in the semiconductor manufacturing equipment industry. His work has been instrumental in pushing the boundaries of substrate processing technology, making substantial contributions to the company’s innovative capabilities.

Collaborations

Throughout his career, Goshi has collaborated with notable colleagues such as Keisuke Egashira and Hiroki Ohno. Together, they have been pivotal in advancing the field of substrate processing, leveraging their combined expertise to tackle complex challenges in the industry.

Conclusion

Gentaro Goshi's innovative spirit and dedication to advancing substrate processing technology reflect the essence of modern invention. With his 24 patents, he continues to influence the semiconductor industry significantly, offering insights and solutions that optimize processing methods and enhance device performance. Goshi remains a prominent figure in the world of inventors, whose contributions are poised to shape the future of technology.

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