The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Nov. 29, 2017
Tokyo Electron Limited, Tokyo, JP;
Shotaro Kitayama, Kumamoto, JP;
Gentaro Goshi, Kumamoto, JP;
Hiroki Ohno, Kumamoto, JP;
Keisuke Egashira, Kumamoto, JP;
Yosuke Kawabuchi, Kumamoto, JP;
Hiroshi Marumoto, Kumamoto, JP;
Takuro Masuzumi, Kumamoto, JP;
Kento Tsukano, Kumamoto, JP;
Hiromi Kiyose, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
Disclosed is a method of cleaning a substrate processing apparatus in which a substrate having a surface wet by a liquid is brought into contact with a supercritical fluid so as to perform a drying process of drying the substrate. The method includes a cleaning gas filling process and an exhausting process. The cleaning gas filling process fills a cleaning gas containing isopropyl alcohol in the substrate processing apparatus. The exhausting process exhausts the cleaning gas from an inside of the substrate processing apparatus after the cleaning gas filling process.