Kumamoto, Japan

Shotaro Kitayama

USPTO Granted Patents = 4 

Average Co-Inventor Count = 8.7

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2019-2021

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4 patents (USPTO):Explore Patents

Title: **Innovative Genius: The Patents of Shotaro Kitayama**

Introduction

Shotaro Kitayama, a talented inventor based in Kumamoto, Japan, has made significant contributions to the field of substrate processing technologies. With a total of four patents to his name, he has showcased his expertise through innovative methodologies and apparatus designs that enhance cleaning processes in various applications.

Latest Patents

Among his latest inventions is the "Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus." This groundbreaking method involves bringing a substrate, whose surface is wet with liquid, into contact with a supercritical fluid for drying. The process encompasses a cleaning gas filling phase, where a gas containing isopropyl alcohol is introduced into the substrate processing apparatus, followed by an exhausting phase that removes the cleaning gas post-application. His other notable patent, "Substrate processing apparatus," presents an exemplary embodiment featuring a main body with a processing space designed to accommodate the substrate. This apparatus includes a holding unit, a supply unit for processing fluid, a discharge unit, and a flow path limiting unit that optimizes fluid flow during processing.

Career Highlights

Shotaro currently works with Tokyo Electron Limited, a prominent company specializing in the manufacturing of high-tech equipment for semiconductor manufacturing. His role allows him to push the boundaries of technology, contributing to advancements that aid in efficient substrate processing solutions.

Collaborations

In his journey, Shotaro has collaborated with esteemed colleagues such as Gentaro Goshi and Keisuke Egashira, who share his commitment to innovation and excellence in engineering. Together, they have worked on projects that harness their collective expertise in the field, leading to impactful advancements in substrate processing technology.

Conclusion

Shotaro Kitayama's contributions to the realm of substrate processing exemplify the spirit of innovation. His inventions not only help in improving manufacturing processes but also pave the way for future advancements in technology. With his ongoing work at Tokyo Electron Limited and collaboration with skilled professionals, Shotaro continues to influence the industry's landscape significantly.

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