The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Oct. 02, 2006
Yoshiteru Fukuda, Koshi, JP;
Nobuhiro Ogata, Koshi, JP;
Takayuki Ishii, Koshi, JP;
Keiji Tanouchi, Nirasaki, JP;
Yoshiteru Fukuda, Koshi, JP;
Nobuhiro Ogata, Koshi, JP;
Takayuki Ishii, Koshi, JP;
Keiji Tanouchi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A spin chuck rotatably holds a semiconductor wafer, while resist is dropped on a surface of the semiconductor wafer through a resist application nozzle and thus applied thereon, and before the resist applied on the wafer dries, a cleaning liquid is supplied through a bevel cleaning nozzle to a portion of the wafer located at a peripheral portion thereof in a vicinity of a beveled portion to remove the resist adhering to the beveled portion. Thereafter, a film of the resist that is formed on the surface of the wafer is dried.