Koshi, Japan

Yoshiteru Fukuda


Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Koshi-machi, JP (2009)
  • Kumamoto, JP (2009 - 2020)
  • Koshi, JP (2010 - 2024)

Company Filing History:


Years Active: 2009-2024

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9 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Yoshiteru Fukuda

Introduction

Yoshiteru Fukuda, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate processing technology. With a total of nine patents to his name, Fukuda continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents, Fukuda developed a substrate processing apparatus designed to enhance the efficiency of substrate treatment. This apparatus features an air supply system that directs air into the substrate's location, combined with a rectifying member containing multiple through holes. This design allows for effective rectification of the air flow, ensuring optimal conditions for substrate processing.

Another notable invention is his liquid processing method aimed at drying horizontally held substrates after applying deionized water. The method is intricate, involving the sequential application of deionized water, a first solvent, a water-repellent agent, and a second solvent, ultimately leading to the removal of the second solvent. The careful selection of specific gravities among these substances plays a crucial role in achieving the desired water-repellency on the substrate's surface.

Career Highlights

Fukuda has gained invaluable experience working with renowned companies, notably Tokyo Electron Limited. His tenure at this leading firm reflects his expertise and impact in the semiconductor and electronics sectors. Over the years, his inventive spirit and dedication to advancing technology have garnered him respect among peers and industry stakeholders.

Collaborations

Throughout his career, Fukuda has collaborated with talented colleagues, including Takayuki Ishii and Tomohiro Iseki. These partnerships have fostered a collaborative environment that emphasizes innovation and knowledge sharing, contributing to the successful development of groundbreaking technologies and patents.

Conclusion

Yoshiteru Fukuda stands as a prominent figure in the realm of substrate processing technology, driven by an unwavering commitment to innovation. His contributions, alongside his collaborative efforts, underscore the importance of teamwork and creativity in advancing technological frontiers. With his wealth of patents and continued dedication, Fukuda is poised to make even more significant advancements in the years to come.

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