The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Feb. 14, 2017
Tokyo Electron Limited, Tokyo, JP;
Yosuke Kawabuchi, Kumamoto, JP;
Kouzou Tachibana, Kumamoto, JP;
Mitsunori Nakamori, Kumamoto, JP;
Kotaro Ooishi, Kumamoto, JP;
Keisuke Egashira, Kumamoto, JP;
Koji Tanaka, Kumamoto, JP;
Hiroaki Inadomi, Kumamoto, JP;
Masami Yamashita, Kumamoto, JP;
Yoshiteru Fukuda, Kumamoto, JP;
Koji Yamashita, Kumamoto, JP;
Yu Tsurifune, Kumamoto, JP;
Takuro Masuzumi, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
Disclosed is a liquid processing method of drying a substrate held horizontally after supplying deionized water to the substrate. The liquid processing method includes: supplying the deionized water to a front surface of the substrate; supplying a first solvent to the front surface of the substrate after supplying the deionized water; supplying a water-repellent agent to the front surface of the substrate to impart water-repellency to the front surface of the substrate; supplying a second solvent to the front surface of the substrate to which water-repellency is imparted; and removing the second solvent from the front surface of the substrate. A specific gravity of the first solvent is smaller than a specific gravity of the water-repellent agent, and a specific gravity of the second solvent is larger than the specific gravity of the water-repellent agent.