Location History:
- Koshi, JP (2011 - 2013)
- Kumamoto, JP (2016 - 2020)
Company Filing History:
Years Active: 2011-2020
Title: Kotaro Ooishi: Innovator in Liquid Processing Technologies
Introduction
Kotaro Ooishi is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of liquid processing technologies, holding a total of five patents. His innovative approaches have advanced the methods used in substrate processing and water repellency.
Latest Patents
Among his latest patents is a liquid processing method that involves drying a substrate held horizontally after supplying deionized water. This method includes several steps: supplying deionized water to the front surface of the substrate, followed by a first solvent, and then a water-repellent agent to impart water-repellency. The process concludes with the application of a second solvent and the removal of this solvent from the substrate's surface. Another notable patent is for a substrate liquid processing apparatus that features a nozzle with multiple flow paths. This apparatus is designed to perform water repellency imparting processing on a substrate by supplying a silylation liquid through a specialized nozzle.
Career Highlights
Kotaro Ooishi has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor industry.
Collaborations
Throughout his career, Kotaro has collaborated with talented individuals such as Hisashi Kawano and Yosuke Hachiya. These partnerships have fostered innovation and the development of advanced processing techniques.
Conclusion
Kotaro Ooishi's work in liquid processing technologies exemplifies the spirit of innovation. His patents and collaborations have significantly impacted the industry, showcasing his expertise and dedication to advancing technology.