The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Feb. 27, 2006
Takashi Takekuma, Kumamoto, JP;
Yasuyuki Kometani, Kumamoto, JP;
Yoshiteru Fukuda, Kumamoto, JP;
Junya Minamida, Kumamoto, JP;
Takashi Takekuma, Kumamoto, JP;
Yasuyuki Kometani, Kumamoto, JP;
Yoshiteru Fukuda, Kumamoto, JP;
Junya Minamida, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.