Tokyo, Japan

Satoru Tanaka

This inventor holds 73 USPTO granted patents and 20 published patent applications, plus 1 CIPO patent and 9 EPO patents, primarily in Substrate Processing (CPC class H01L). Top assignees: Tokyo Electron Limited, Eisai Company, Limited, Scivax Corporation.. Active years: 1976-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Tanaka. Retrieved from https://idiyas.com/inventor/satoru-tanaka-pco3nt49

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 73 

% Patents Active = 86.3

 

 

Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 233(Granted Patents)

Forward Citations (Not Self Cited) = 209(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Higashi-Kurume, JA (1976 - 1978)
  • Higashikurume, JP (1978 - 1984)
  • Abiko, JP (1987)
  • Tosu, JP (2010 - 2013)
  • Kumamoto, JP (2012 - 2017)
  • Kanagawa, JP (2017 - 2020)
  • Koshi, JP (2010 - 2022)
  • Kawasaki, JP (2012 - 2022)
  • Kawasaki Kanagawa, JP (2022)
  • Tokyo, JP (1985 - 2024)

Company Filing History:


Years Active: 1976-2026

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Areas of Expertise:
Substrate Processing
Imprint Device
Optical System
Semiconductor Light Emitting Device
Cleaning Method
Control Apparatus
Data Acquisition
Molding Method
Heat Source System
Microstructure Formation
Liquid Processing
Navigation System
73 patents (USPTO):Explore Patents

Title: Innovations by Satoru Tanaka: A Leader in Patented Technologies

Introduction

Satoru Tanaka is a prominent inventor based in Tokyo, Japan, known for his significant contributions to technology and innovation. With an impressive portfolio of 66 patents, Tanaka has made strides in various fields, particularly in control apparatus and semiconductor devices. His inventions reflect a deep understanding of modern technological needs and a commitment to advancing industry standards.

Latest Patents

Tanaka's recent patents demonstrate his innovative prowess. One such invention is a **control apparatus, control method, and storage medium**, which includes an acquisition unit designed to gather measurement values related to control target equipment. The apparatus employs both feedback control and feed-forward control mechanisms to optimize operation amounts. Furthermore, a second control unit utilizes models developed from learning data, enabling a sophisticated switching capability between the control units.

Another noteworthy patent concerns a **semiconductor light emitting device and method of manufacturing a semiconductor light emitting device with a patterned light extraction surface**. This invention involves a light extraction layer featuring cone-shaped and granular parts, enhancing light extraction efficiency. The manufacturing method is meticulously outlined, involving a multi-step etching process that ensures precision in creating the device's intricate design.

Career Highlights

Throughout his career, Satoru Tanaka has worked with renowned organizations, including Tokyo Electron Limited and Eisai Company, Limited. His expertise in engineering and technology has been key to his success in these companies, allowing him to innovate and contribute effectively.

Collaborations

Tanaka has collaborated with several distinguished colleagues, including Takehiko Orii and Hirosuke Kawaguchi. These partnerships have fostered a dynamic exchange of ideas, further enriching the innovative environment in which he operates.

Conclusion

Satoru Tanaka exemplifies the spirit of innovation and excellence in the field of technology. With a remarkable number of patents and significant contributions to semiconductor technology and control systems, he remains a pivotal figure in advancing modern industry standards. His work not only impacts his immediate field but also serves as an inspiration for future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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