Location History:
- Koshi, JP (2017 - 2023)
- Kumamoto, JP (2017 - 2023)
Company Filing History:
13 out of 10,326 
1 out of 1,058 
Years Active: 2017-2023
Title: Meitoku Aibara: Innovator in Substrate Cleaning Technologies
Introduction
Meitoku Aibara is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate cleaning technologies. With a total of 13 patents to his name, Aibara has developed innovative methods and systems that enhance the efficiency of substrate cleaning processes in various industries.
Latest Patents
Aibara's latest patents include a substrate cleaning method and a substrate cleaning system. The substrate cleaning method involves supplying a film-forming treatment liquid containing a volatile component to a substrate, forming a film on the substrate. It also includes supplying a peeling treatment liquid to remove the treatment film and a hydrophobic liquid to hydrophobize the substrate. The substrate cleaning apparatus consists of multiple processing units designed to remove residues from substrates with exposed metal films, ensuring the effective formation and removal of protective films.
Career Highlights
Throughout his career, Aibara has worked with notable companies such as Tokyo Electron Limited and JSR Corporation. His experience in these organizations has allowed him to refine his expertise in substrate cleaning technologies and contribute to advancements in the field.
Collaborations
Aibara has collaborated with talented individuals in the industry, including Itaru Kanno and Yuki Yoshida. These collaborations have fostered innovation and the development of cutting-edge technologies in substrate cleaning.
Conclusion
Meitoku Aibara's work in substrate cleaning technologies showcases his dedication to innovation and excellence. His patents and career achievements reflect his significant impact on the industry, making him a noteworthy figure in the field of inventions.