Meitoku Aibara

This inventor holds 13 USPTO granted patents and 3 published patent applications, primarily in Substrate Cleaning. Top assignees: Tokyo Electron Limited, Jsr Corporation. Active years: 2017-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Meitoku Aibara. Retrieved from https://idiyas.com/inventor/meitoku-aibara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 13 (Patent Applications = 3)

% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 31(Granted Patents)

Location History:

Koshi, JP (2017 - 2023)
Kumamoto, JP (2017 - 2023)

Company Filing History:

13 out of 10,947

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2017-2023

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Areas of Expertise:

Substrate Cleaning

Processing System

Memory Medium

Cleaning Method

Storage Medium

Nozzle Cleaning

Recording Medium

Processing Apparatus

Substrate Processing

System Design

13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11600499 - Substrate cleaning method, substrate cleaning system, and storage medium (2023-03-07),

2. 11551941 - Substrate cleaning method (2023-01-10),

3. 11367630 - Substrate cleaning method, substrate cleaning system, and memory medium (2022-06-21),

4. 10811283 - Substrate cleaning method, substrate cleaning system, and memory medium (2020-10-20),

5. 10792711 - Substrate processing system, substrate cleaning method, and recording medium (2020-10-06),

6. 10734255 - Substrate cleaning method, substrate cleaning system and memory medium (2020-08-04),

7. 10272478 - Substrate processing system, substrate cleaning method, and recording medium (2019-04-30),

8. 10121646 - Substrate processing apparatus and substrate processing method (2018-11-06),

9. 9953826 - Substrate cleaning method, substrate cleaning system, and memory medium (2018-04-24),

10. 9870914 - Substrate processing apparatus and substrate processing method (2018-01-16),

11. 9818598 - Substrate cleaning method and recording medium (2017-11-14),

12. 9768039 - Substrate processing apparatus (2017-09-19),

13. 9764345 - Substrate processing apparatus and nozzle cleaning method (2017-09-19),

Title: Meitoku Aibara: Innovator in Substrate Cleaning Technologies

Introduction

Meitoku Aibara is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate cleaning technologies. With a total of 13 patents to his name, Aibara has developed innovative methods and systems that enhance the efficiency of substrate cleaning processes in various industries.

Latest Patents

Aibara's latest patents include a substrate cleaning method and a substrate cleaning system. The substrate cleaning method involves supplying a film-forming treatment liquid containing a volatile component to a substrate, forming a film on the substrate. It also includes supplying a peeling treatment liquid to remove the treatment film and a hydrophobic liquid to hydrophobize the substrate. The substrate cleaning apparatus consists of multiple processing units designed to remove residues from substrates with exposed metal films, ensuring the effective formation and removal of protective films.

Career Highlights

Throughout his career, Aibara has worked with notable companies such as Tokyo Electron Limited and JSR Corporation. His experience in these organizations has allowed him to refine his expertise in substrate cleaning technologies and contribute to advancements in the field.

Collaborations

Aibara has collaborated with talented individuals in the industry, including Itaru Kanno and Yuki Yoshida. These collaborations have fostered innovation and the development of cutting-edge technologies in substrate cleaning.

Conclusion

Meitoku Aibara's work in substrate cleaning technologies showcases his dedication to innovation and excellence. His patents and career achievements reflect his significant impact on the industry, making him a noteworthy figure in the field of inventions.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

3 patents pending: