The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Jul. 27, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Meitoku Aibara, Koshi, JP;

Yuki Yoshida, Koshi, JP;

Hisashi Kawano, Koshi, JP;

Masami Yamashita, Koshi, JP;

Itaru Kanno, Tokyo, JP;

Kenji Mochida, Tokyo, JP;

Motoyuki Shima, Tokyo, JP;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/08 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 3/08 (2013.01); H01L 21/02057 (2013.01); H01L 21/6715 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01);
Abstract

An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment includes a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, the treatment film includes an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.


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