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Hisashi Kawano

USPTO Granted Patents = 17 (Patent Applications = 8)

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 26(Granted Patents)

Location History:

Kumamoto, JP (2016 - 2021)
Koshi, JP (2011 - 2022)

Company Filing History:

17 out of 10,341

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2011-2022

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17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11424141 - Substrate processing apparatus, substrate processing method and recording medium (2022-08-23),

2. 11087992 - Substrate processing method and substrate processing apparatus (2021-08-10),

3. 11075096 - Substrate processing apparatus (2021-07-27),

4. 10923368 - Substrate processing apparatus, substrate processing method, and storage medium (2021-02-16),

5. 10792711 - Substrate processing system, substrate cleaning method, and recording medium (2020-10-06),

6. 10651061 - Substrate processing apparatus, substrate processing method and recording medium (2020-05-12),

7. 10272478 - Substrate processing system, substrate cleaning method, and recording medium (2019-04-30),

8. 10192758 - Substrate processing apparatus (2019-01-29),

9. 10121646 - Substrate processing apparatus and substrate processing method (2018-11-06),

10. 10062586 - Chemical fluid processing apparatus and chemical fluid processing method (2018-08-28),

11. 9953840 - Substrate processing method and substrate processing system (2018-04-24),

12. 9922849 - Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof (2018-03-20),

13. 9870914 - Substrate processing apparatus and substrate processing method (2018-01-16),

14. 9818598 - Substrate cleaning method and recording medium (2017-11-14),

15. 9805957 - Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing program (2017-10-31),

Title: Hisashi Kawano: Innovator in Substrate Processing Technology

Introduction

Hisashi Kawano is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 17 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods and apparatuses.

Latest Patents

Kawano's latest patents include a substrate processing apparatus, a substrate processing method, and a recording medium. These innovations aim to shorten etching processing times. The substrate processing apparatus features a processing tub designed to perform etching with an etching liquid. Additionally, it includes a mixing unit that combines a new liquid with a silicon-containing compound. The supply line is responsible for delivering the mixed solution into the substrate processing tub. His etching method consists of a first etching step, a processing step, and a second etching step, which collectively enhance the processing of substrates with silicon oxide and silicon nitride films.

Career Highlights

Throughout his career, Kawano has worked with notable companies such as Tokyo Electron Limited and JSR Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in substrate processing.

Collaborations

Kawano has collaborated with several talented individuals in his field, including Yuki Yoshida and Meitoku Aibara. These collaborations have contributed to the advancement of substrate processing technologies.

Conclusion

Hisashi Kawano's contributions to substrate processing technology have made a significant impact in the industry. His innovative patents and collaborations reflect his dedication to improving processing methods and apparatuses.

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