The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Jul. 27, 2015
Tokyo Electron Limited, Tokyo, JP;
Jsr Corporation, Tokyo, JP;
Meitoku Aibara, Koshi, JP;
Yuki Yoshida, Koshi, JP;
Hisashi Kawano, Koshi, JP;
Masami Yamashita, Koshi, JP;
Itaru Kanno, Tokyo, JP;
Kenji Mochida, Tokyo, JP;
Motoyuki Shima, Tokyo, JP;
Tokyo Electron Limited, Minato-Ku, JP;
JSR Corporation, Minato-Ku, JP;
Abstract
An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.