The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Jun. 05, 2014
Tokyo Electron Limited, Tokyo, JP;
Yosuke Kawabuchi, Koshi, JP;
Hisashi Kawano, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Hiroyuki Suzuki, Koshi, JP;
Kotaro Oishi, Koshi, JP;
Kazuyoshi Shinohara, Koshi, JP;
Yuki Yoshida, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A throughput in processing a substrate can be improved and a running cost thereof can be reduced. A substrate processing apparatusthat processes a substratewith a processing liquid and dries the substrateincludes a substrate rotating deviceconfigured to rotate the substrate; a processing liquid discharging unitconfigured to discharge the processing liquid toward the substrate; a substitution liquid discharging unitconfigured to discharge a substitution liquid, which is substituted with the processing liquid on the substrate, toward the substratewhile relatively moving with respect to the substrate; and an inert gas discharging unitconfigured to discharge an inert gas toward a peripheral portion of the substratein an inclined direction from above the substratewhile moving in a direction different from a direction in which the substitution liquid discharging unitis moved.