Location History:
- Koshi, JP (2016 - 2020)
- Kumamoto, JP (2021)
- Kumato, JP (2022)
Company Filing History:
Years Active: 2016-2022
Title: Innovations by Hiroyuki Suzuki
Introduction
Hiroyuki Suzuki is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 6 patents. His work focuses on advanced methods that enhance the efficiency and effectiveness of substrate treatment processes.
Latest Patents
Among his latest patents is a method for processing a substrate that involves a first etch process to create partial features in a dielectric layer. This is followed by an irradiation process that exposes the substrate to ultra-violet radiation with a wavelength between 100 nm and 200 nm. After this irradiation, a second etch process is performed to develop distinct features from the initial partial features. Another notable patent is a substrate processing method that includes supplying a treatment liquid to a horizontally held substrate, substituting it with a solvent of lower surface tension, and drying the substrate by shaking off the solvent at a specific rotation number, ensuring that the intermediate portion dries last.
Career Highlights
Hiroyuki Suzuki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative approaches have positioned him as a key figure in substrate processing technology.
Collaborations
He has collaborated with notable coworkers such as Yosuke Kawabuchi and Satoru Tanaka, contributing to advancements in their shared field of expertise.
Conclusion
Hiroyuki Suzuki's work exemplifies the impact of innovative thinking in substrate processing, and his patents continue to influence the industry significantly.