The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Aug. 02, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Hiroyuki Suzuki, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); H01L 21/32134 (2013.01); H01L 21/67023 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01);
Abstract
A substrate processing method includes: supplying a treatment liquid to a substrate held in a horizontal position; substituting the treatment liquid supplied to the substrate with a solvent having a lower surface tension than the treatment liquid; and drying the substrate by shaking off the solvent on the substrate at a preset rotation number so that an intermediate portion of the substrate located between a central portion and a peripheral portion of the substrate is last dried.