The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
May. 30, 2014
Tokyo Electron Limited, Tokyo, JP;
Yoshihiro Kai, Kumamoto, JP;
Yoshinori Ikeda, Kumamoto, JP;
Kazuyoshi Shinohara, Kumamoto, JP;
Tetsuya Oda, Kumamoto, JP;
Satoru Tanaka, Kumamoto, JP;
Yuki Yoshida, Kumamoto, JP;
Meitoku Aibara, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus according to the present disclosure includes first and second nozzles that eject a processing liquid to a substrate; a moving mechanism that moves the first and second nozzles; and a nozzle cleaning device that cleans at least the second nozzle. The nozzle cleaning device includes a cleaning bath and an overflow bath. The cleaning bath includes a liquid storage portion that stores a cleaning liquid for cleaning the second nozzle, and an overflow portion that discharges the cleaning liquid exceeding a predetermined level from the liquid storage portion. The overflow bath is disposed adjacent to the cleaning bath and receives the cleaning liquid discharged from the overflow portion and discharge the received cleaning liquid to the outside.