Tetsuya Oda

Title: Tetsuya Oda: Innovator in Substrate Processing Technology

Introduction

Tetsuya Oda is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 10 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing apparatuses and methods.

Latest Patents

One of his latest patents is a substrate processing apparatus and nozzle cleaning method. This invention includes first and second nozzles that eject a processing liquid to a substrate. It features a moving mechanism that moves the nozzles and a nozzle cleaning device that cleans at least the second nozzle. The cleaning device comprises a cleaning bath and an overflow bath, ensuring effective cleaning of the nozzles.

Another notable patent is an apparatus and method for heating substrates and a coating and developing system. This substrate heating apparatus includes a top plate arranged above a hot plate, creating a vertical space that serves as a vacuum insulating layer. This design suppresses heat transfer, enhancing the heating process for substrates.

Career Highlights

Tetsuya Oda has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to develop innovative solutions in substrate processing technology.

Collaborations

Throughout his career, Tetsuya has collaborated with talented individuals, including Mitsuhiro Tanoue and Shinichi Hayashi. These collaborations have contributed to the advancement of technology in his field.

Conclusion

Tetsuya Oda's contributions to substrate processing technology through his patents and collaborations highlight his role as an influential inventor. His innovative solutions continue to impact the industry positively.