Sendai, Japan

Tadahiro Ohmi

Average Co-Inventor Count = 3.2

ph-index = 26

Forward Citations = 2,731(Granted Patents)

Forward Citations (Not Self Cited) = 2,574(Sep 21, 2024)

DiyaCoin DiyaCoin 2.40 

Inventors with similar research interests:



Years Active: 1981-2018

where 'Filed Patents' based on already Granted Patents

201 patents (USPTO):

Title: Tadahiro Ohmi: Innovations and Patents Extraordinaire

Introduction:

Tadahiro Ohmi is a renowned inventor and researcher hailing from Sendai, Japan. With an impressive portfolio of 201 patents to his name, Ohmi has made significant contributions in the fields of film surface smoothing and semiconductor transistors. Let's delve deeper into his latest patents, career highlights, collaborations, and his impact on the world of innovation.

Latest Patents:

Ohmi's recent patents include the "Method for smoothing a perfluoro alkoxy alkane film surface" and the "Semiconductor transistor."

The first patent focuses on improving the smoothness of the free surface area of a perfluoro alkoxy alkane (PFA) film. By subjecting the film to specific temperature conditions, Ohmi's method ensures that the film's free surface area is melted, solidified, and then remelted, resulting in enhanced smoothness. This technique finds applications in various industries where PFA films are used, such as AlO, Ni, or NiF films.

Ohmi's second patent revolves around semiconductor transistors. He introduces a novel design involving an active layer composed of GaN-based semiconductor and a gate insulating film. The gate insulating film comprises a first insulating film (including compounds like AlO, HfO, ZrO, LaO, and YO) and a second insulating film composed of SiO on top of it. This innovation contributes to the advancement of semiconductor technology, paving the way for improved transistor performance.

Career Highlights:

Throughout his career, Tadahiro Ohmi has made significant contributions to the field of innovation. He has worked with esteemed companies, including Tokyo Electron Limited and Canon Kabushiki Kaisha.

At Tokyo Electron Limited, Ohmi's expertise was invaluable in the development of cutting-edge technologies related to semiconductor manufacturing. His contributions in this field have had a profound impact on the efficiency and performance of semiconductor devices.

During his tenure at Canon Kabushiki Kaisha, Ohmi played a key role in the company's research and development endeavors. His deep understanding of materials science and semiconductor technologies allowed him to contribute to the advancement of Canon's products and patents.

Collaborations:

Throughout his professional journey, Tadahiro Ohmi has collaborated with numerous experts and coworkers. Notable among them are Nobukazu Ikeda and Masaki Hirayama. Through collaborative efforts, these individuals have facilitated interdisciplinary research, pushing the boundaries of innovation and achieving remarkable advancements in their respective fields.

Conclusion:

Tadahiro Ohmi's extensive list of patents and career highlights exemplify his relentless pursuit of innovation and breakthroughs. With his inventive mind and keen focus on improving film surfaces and semiconductor transistors, Ohmi has left an indelible mark on the world of technology. His collaborations and contributions to companies like Tokyo Electron Limited and Canon Kabushiki Kaisha have undoubtedly propelled the organizations to new heights. As Tadahiro Ohmi continues to explore new horizons, the world eagerly anticipates the transformative inventions he may yet unveil.

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