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Tadahiro Ohmi

USPTO Granted Patents = 27

% Expired Patents = 33.3

CIPO Patents = 2

Forward Citations = 337

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56 inventors (with patents filed for the assignee):

Tadahiro Ohmi (14 out of 201 patents)

Tadahiro Ohmi (6 out of 53 patents)

Nobukazu Ikeda (5 out of 211 patents)

4. Shigetoshi Sugawa (5 out of 175 patents)

5. Masaki Hirayama (5 out of 88 patents)

6. Tadahiro Ohmi (5 out of 93 patents)

7. Koji Kotani (3 out of 26 patents)

8. Michio Yamaji (2 out of 142 patents)

9. Keiji Hirao (2 out of 34 patents)

10. Masaru Umeda (2 out of 38 patents)

11. Akinobu Teramoto (2 out of 37 patents)

12. Tadashi Shibata (2 out of 68 patents)

13. Akihiro Morimoto (2 out of 51 patents)

14. Takahisa Nitta (2 out of 35 patents)

15. Hiroshi Morokoshi (2 out of 17 patents)

Core Competencies:

Plasma Processing

Semiconductor Manufacturing

Chemical Mechanical Polishing

Fluorine-Containing Films

Data Analysis

Substrate Processing

Flash Memory Devices

Water Hammerless Opening

Lithographic Developer

Photoresist Cleaning

Superhigh Purity Systems

Mask Making

27 patents: Sort by Forward Citations

1. 8513137 - Plasma processing apparatus and plasma processing method (2013-08-20),

2. 8198195 - Plasma processing method and plasma processing apparatus (2012-06-12),

3. 8047225 - Method for water hammerless opening of fluid passage, and method for supplying chemical solutions and device for water hammerless opening for which the method is used (2011-11-01),

4. 8030182 - Semiconductor device manufacturing method and semiconductor manufacturing apparatus (2011-10-04),

5. 7538012 - Fluorine-containing carbon film forming method (2009-05-26),

6. 7478609 - Plasma process apparatus and its processor (2009-01-20),

7. 7474383 - Mask making method, mask making device, and mask drawing device (2009-01-06),

8. 7436999 - Data analysis device and data recognition device (2008-10-14),

9. 7329609 - Substrate processing method and substrate processing apparatus (2008-02-12),

10. 7097735 - Plasma processing device (2006-08-29),

11. 7008598 - Reactor for generating moisture (2006-03-07),

12. 7001855 - Flash memory device and fabrication process thereof, method of forming a dielectric film (2006-02-21),

13. 6998355 - Flash memory device and a fabrication process thereof, method of forming a dielectric film (2006-02-14),

14. 6893970 - Plasma processing method (2005-05-17),

15. 6051851 - Semiconductor devices utilizing silicide reaction (2000-04-18),

Company Overview

Tadahiro Ohmi is a prominent entity based in Miyagi, Japan, specializing in advanced technology solutions and innovative product development. The organization focuses on areas such as electronics, materials science, and engineering, contributing to various sectors including automotive and consumer electronics. With a commitment to research and development, Tadahiro Ohmi aims to enhance technological capabilities and foster advancements that meet the evolving needs of industries and consumers alike.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

27 Patents

#3 in Miyagi

#2,454 in Japan

#23,984 in the World

Tadahiro Ohmi

Forward Citations = 337

56 inventors:

Tadahiro Ohmi (14 out of 201 patents)

Tadahiro Ohmi (6 out of 53 patents)

Nobukazu Ikeda (5 out of 211 patents)

4. Shigetoshi Sugawa (5 out of 175 patents)

5. Masaki Hirayama (5 out of 88 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Tadahiro Ohmi. Retrieved from https://idiyas.com/company/tadahiro-ohmi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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