Tokyo, Japan

Takahisa Nitta

This inventor holds 35 USPTO granted patents, primarily in Welding Technology. Top assignees: Kabushiki Kaisha Ultraclean Technology Research Institute, Sipec Corporation, Tadahiro Ohmi. Active years: 1999-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahisa Nitta. Retrieved from https://idiyas.com/inventor/takahisa-nitta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 74.3

Average Co-Inventor Count = 3.6

ph-index = 12

Forward Citations = 464(Granted Patents)


Location History:

  • Bunkyo-ku, JP (1999)
  • Fuchu, JP (2001)
  • Oume, JP (2004)
  • Tokyo, JP (1999 - 2013)

Company Filing History:


Years Active: 1999-2013

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Areas of Expertise:
Welding Electrode
Plasma Method
Semiconductor Circuit
Chemical Supply
Surface Purification
Oxidation-Passive Layer
Gas Feed System
Cleaning Method
Ultraviolet Processing
Resist Film Removal
Abrasive Composition
Charge Transfer Amplifier
35 patents (USPTO):Explore Patents

Title: Takahisa Nitta: Pioneering Inventor from Tokyo

Introduction: Takahisa Nitta is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Takahisa Nitta holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With over two decades of experience in the industry, Takahisa Nitta has worked with leading tech companies in Japan, spearheading projects that have revolutionized the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Takahisa Nitta has collaborated with top researchers, engineers, and scientists both in Japan and internationally, fostering a culture of innovation and knowledge-sharing in the tech community.

Conclusion: Takahisa Nitta's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and technologists worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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