The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Mar. 28, 2002
Applicants:
Tadahiro Ohmi, Sendai, JP;
Masaki Hirayama, Sendai, JP;
Shigetoshi Sugawa, Sendai, JP;
Tetsuya Goto, Sendai, JP;
Inventors:
Tadahiro Ohmi, Sendai, JP;
Masaki Hirayama, Sendai, JP;
Shigetoshi Sugawa, Sendai, JP;
Tetsuya Goto, Sendai, JP;
Assignees:
Tadahiro Ohmi, Miyagi, JP;
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate.