The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
Oct. 11, 2002
Naoko Yamamoto, Osaka, JP;
I'atsushi Yamamoto, Nara, JP;
Masaki Hirayama, Sendai, JP;
I'adahiro Ohmi, Sendai, JP;
Naoko Yamamoto, Osaka, JP;
I'atsushi Yamamoto, Nara, JP;
Masaki Hirayama, Sendai, JP;
I'adahiro Ohmi, Sendai, JP;
Sharp Kabushiki Kaisha, Osaka-shi, JP;
Tadahiro OHMI, Miyagi, JP;
Abstract
A plasma processing apparatus and a processing apparatus having a widened process condition range allowing plasma generation are obtained by increasing microwave propagation efficiency. The plasma processing apparatus includes a processing chamber where plasma processing is performed, and microwave introducer for introducing microwaves into the processing chamber. The microwave introducer includes a dielectric member transmitting the microwaves. The dielectric member has a shape in cross section in a direction approximately perpendicular to a transmitting direction of the microwaves through the dielectric member that allows transmission of the microwaves of substantially a single mode. The dielectric member has a thickness T in the transmitting direction that satisfies a condition of (λ×(2m+0.7)/4)≦T≦(λ×(2m+1.3)/4), where λ is a wavelength of the microwaves of the single mode transmitted through the dielectric member and m is an arbitrary integer.