The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Jan. 28, 2004
Tadahiro Ohmi, Miyagi, JP;
Shigetoshi Sugawa, Miyagi, JP;
Kiwamu Takehisa, Miyagi, JP;
Tadahiro Ohmi, Sendai-Shi, JP;
Foundation For Advancement Of International Science, Tsukuba, JP;
Abstract
Laser light in a pattern reflected by a two-dimensional array micromirrorthat is controlled on the basis of mask data of a mask pattern data output deviceforms an enlarged pattern. This enlarged pattern is projected in a reduced manner onto a mask substratethrough a reduction-projection optical system, thereby forming a lithography pattern. Since a large number of patterns are written in an instant by the two-dimensional array micromirror, a time required for lithography the entire mask pattern is extremely shortened as compared with a conventional one. As a result, the mask cost can be largely reduced.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile