The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Nov. 17, 2014
Tokyo Electron Limited, Tokyo, JP;
National University Corporation Tohoku University, Sendai-shi, JP;
Masahiro Okesaku, Komatsu, JP;
Tadahiro Ohmi, Sendai, JP;
Tetsuya Goto, Sendai, JP;
Takaaki Matsuoka, Tokyo, JP;
Toshihisa Nozawa, Kurokawa-gun, JP;
Atsutoshi Inokuchi, Kurokawa-gun, JP;
Kiyotaka Ishibashi, Kurokawa-gun, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, Sendai-Shi, JP;
Abstract
A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.