Company Filing History:

27 out of 10,295

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2008-2023

where 'Filed Patents' based on already Granted Patents

27 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11692269 - Plasma processing apparatus (2023-07-04),

2. 10570512 - Substrate processing apparatus (2020-02-25),

3. 10388557 - Placing bed structure, treating apparatus using the structure, and method for using the apparatus (2019-08-20),

4. 9767994 - Shower plate sintered integrally with gas release hole member and method for manufacturing the same (2017-09-19),

5. 9767993 - Plasma processing apparatus (2017-09-19),

6. 9670584 - Plasma processing device (2017-06-06),

7. 9595425 - Antenna, dielectric window, plasma processing apparatus and plasma processing method (2017-03-14),

8. 9418822 - Plasma processing apparatus, plasma processing method and high frequency generator (2016-08-16),

9. 9237638 - Plasma processing apparatus and substrate processing method (2016-01-12),

10. 9177846 - Placing bed structure, treating apparatus using the structure, and method for using the apparatus (2015-11-03),

11. 9111726 - Plasma processing apparatus (2015-08-18),

12. 8967080 - Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method (2015-03-03),

13. 8925351 - Manufacturing method of top plate of plasma processing apparatus (2015-01-06),

14. 8915999 - Shower plate sintered integrally with gas release hole member and method for manufacturing the same (2014-12-23),

15. 8419859 - Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced, and memory medium memorizing program executing the cleaning method (2013-04-16),

Title: Kiyotaka Ishibashi: Innovator in Plasma Processing Technology

Introduction

Kiyotaka Ishibashi, based in Amagasaki, Japan, is a notable inventor recognized for his contributions to plasma processing technology. With an impressive portfolio of 27 patents, Ishibashi has made significant advancements that impact various industries.

Latest Patents

Among his latest inventions, Ishibashi has developed a plasma processing apparatus that features a cylindrical processing container equipped with a pair of plasma electrodes aligned along its length. This apparatus includes a radio-frequency power supply that optimizes plasma generation for enhanced performance. Additionally, he has designed a substrate processing apparatus that utilizes a rotatable placing table, enabling efficient substrate handling and gas supply through designated regions while generating plasma via a microwave antenna system. These innovative designs reflect Ishibashi's commitment to improving plasma processing techniques.

Career Highlights

Ishibashi has had a distinguished career with prominent organizations, including Tokyo Electron Limited and the National University Corporation Tohoku University. His roles in these institutions have allowed him to lead groundbreaking research and development efforts, further establishing his reputation as a leading inventor in the field.

Collaborations

Throughout his career, Ishibashi has collaborated with notable colleagues, such as Toshihisa Nozawa and Caizhong Tian. These partnerships have facilitated the sharing of ideas and expertise, resulting in innovative solutions that push the boundaries of plasma technology.

Conclusion

Kiyotaka Ishibashi's contributions to plasma processing technology underscore his innovative spirit and dedication to advancing scientific knowledge. With a strong focus on enhancing processing apparatus, his work continues to inspire future developments in the field. Ishibashi stands as a testament to the impact that determined inventors can have in shaping technology for the betterment of society.

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