The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Apr. 24, 2012
Kazuki Moyama, Miyagi, JP;
Kiyotaka Ishibashi, Miyagi, JP;
Osamu Morita, Miyagi, JP;
Takehiro Tanikawa, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Naoki Mihara, Miyagi, JP;
Wataru Yoshikawa, Miyagi, JP;
Kazuki Moyama, Miyagi, JP;
Kiyotaka Ishibashi, Miyagi, JP;
Osamu Morita, Miyagi, JP;
Takehiro Tanikawa, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Naoki Mihara, Miyagi, JP;
Wataru Yoshikawa, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a processing chamber, a stage, a dielectric member, a microwave introduction device, an injector, and an electric field shield. The processing chamber has a processing space therein. The stage is provided within the processing chamber. The dielectric member has a through hole and is provided to face the stage. The microwave introduction device is configured to introduce microwave into the processing space via the dielectric member. The injector has at least one through hole and is made of a dielectric material, e.g., a bulk dielectric material. The injector is provided within the dielectric member. The injector and the through hole of the dielectric member form a path for supplying a processing gas into the processing space. The electric field shield encloses the injector.