Miyagi, Japan

Takehiro Tanikawa

USPTO Granted Patents = 13 

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2015-2025

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: Takehiro Tanikawa: Innovator in Plasma Processing Technology

Introduction

Takehiro Tanikawa is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 13 patents. His innovative work has advanced the capabilities of deposition methods and processing apparatuses.

Latest Patents

Among his latest patents, Tanikawa has developed a deposition method and processing apparatus. This invention features a stage that includes a base and an electrostatic chuck with N electrodes, where N is an integer greater than or equal to two. The stage is equipped with a power supply that applies voltages of different N-phases to the respective N electrodes. Each voltage alternates between positive and negative levels periodically. Another notable patent is a plasma processing apparatus that consists of a chamber, a wall member, an insulating member, and a ground member. The wall member is partially placed within the chamber and is exposed to an external space. The ground member, made of silicon, is mounted on the insulating member in a non-contact state.

Career Highlights

Takehiro Tanikawa is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processing technologies.

Collaborations

Tanakawa has collaborated with notable coworkers, including Kazuki Moyama and Naoki Matsumoto. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Takehiro Tanikawa's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing.

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