The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Jun. 17, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yusuke Hayasaka, Miyagi, JP;
Jun Young Chung, Hwaseong-si, KR;
Shuhei Yamabe, Miyagi, JP;
Keiichi Yamaguchi, Miyagi, JP;
Takehiro Tanikawa, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32522 (2013.01); H01J 37/32449 (2013.01); H01J 37/32477 (2013.01); H01J 37/32651 (2013.01); H01J 37/32743 (2013.01); H01J 2237/334 (2013.01);
Abstract
A substrate processing apparatus includes a chamber having a plasma processing space, a sidewall of the chamber having an opening for transferring a substrate into the plasma processing space; and a shutter disposed at an inner side than the sidewall and configured to open or close the opening, the shutter having a flow path for a temperature-controlled fluid.