Miyagi, Japan

Keiichi Yamaguchi

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiichi Yamaguchi. Retrieved from https://idiyas.com/inventor/keiichi-yamaguchi-3vbdfrov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Keiichi Yamaguchi - Innovator in Substrate Processing Technology

Introduction

Keiichi Yamaguchi is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Keiichi Yamaguchi holds 1 patent for a substrate processing apparatus. This apparatus features a chamber with a plasma processing space. The sidewall of the chamber includes an opening for transferring a substrate into the plasma processing space. Additionally, a shutter is positioned on the inner side of the sidewall, which can open or close the opening. The shutter is designed with a flow path for a temperature-controlled fluid, showcasing Yamaguchi's ingenuity in improving substrate processing methods.

Career Highlights

Yamaguchi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role at the company allows him to further develop and refine his innovative ideas in substrate processing technology.

Collaborations

Throughout his career, Keiichi Yamaguchi has collaborated with talented individuals such as Yusuke Hayasaka and Jun Young Chung. These collaborations have contributed to the advancement of technology in their field.

Conclusion

Keiichi Yamaguchi's contributions to substrate processing technology exemplify his innovative spirit and dedication to advancing the industry. His patent for a substrate processing apparatus highlights his ability to create solutions that enhance efficiency and effectiveness in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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