The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Jul. 05, 2012
Naoki Matsumoto, Miyagi, JP;
Wataru Yoshikawa, Miyagi, JP;
Jun Yoshikawa, Miyagi, JP;
Kazuki Moyama, Miyagi, JP;
Kiyotaka Ishibashi, Miyagi, JP;
Osamu Morita, Miyagi, JP;
Takehiro Tanikawa, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Wataru Yoshikawa, Miyagi, JP;
Jun Yoshikawa, Miyagi, JP;
Kazuki Moyama, Miyagi, JP;
Kiyotaka Ishibashi, Miyagi, JP;
Osamu Morita, Miyagi, JP;
Takehiro Tanikawa, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
An antenna, a dielectric window, a plasma processing apparatus and a plasma processing method are capable of improving uniformity of a substrate surface processing amount in the surface of the substrate. The antenna includes the dielectric window; and a slot plate, provided on one side of the dielectric window, having a plurality of slots. The dielectric windowhas a flat surfacesurrounded by a ring-shaped first recess; and a plurality of second recessesformed on the flat surfaceso as to surround a center of the flat surface. Here, the flat surfaceis formed on the other side of the dielectric window. When viewed from a thickness direction of the slot plate, a center of each second recessis located within each slotof the slot plate.