logo

For the Inventor, By the Inventor

Miyagi, Japan

Jun Yoshikawa

This inventor holds 33 USPTO granted patents and 5 published patent applications and 2 EPO patents, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Asm IP Holding B.v., Rohm Co., Ltd.. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Yoshikawa. Retrieved from https://idiyas.com/inventor/jun-yoshikawa-wvlu242p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 87.9


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 945(Granted Patents)


Location History:

  • Nirasaki, JP (2013 - 2014)
  • Hyogo, JP (2014 - 2015)
  • Sendai, JP (2013 - 2016)
  • Amagasaki, JP (2011 - 2018)
  • Miyagi, JP (2015 - 2022)
  • Hachioji, JP (2022 - 2024)

Company Filing History:

goldMedal27 out of 10,904 
 
Tokyo Electron Limited
 patents
silverMedal6 out of 1,318 
 
Asm IP Holding B.v.
 patents
bronzeMedal1 out of 6,021 
 
Rohm Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2011-2026

Loading Chart...
Loading Chart...
Areas of Expertise:
Plasma Processing
Electronic Structure
Reforming Gas
Temperature Control
Microwave Control
Antenna Design
Film Deposition
Dielectric Window
Substrate Treatment
Baffle Plate
Apparatus Design
Plasma Treatment
33 patents (USPTO):Explore Patents
1. 12760418 - Gas supply unit and substrate processing apparatus including gas supply unit (2026-10-13),
2. 12272548 - Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method (2025-04-08),
3. 12125684 - Temperature controlled reaction chamber (2024-10-22),
4. 11908684 - Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method (2024-02-20),
5. 11605528 - Plasma device using coaxial waveguide, and substrate treatment method (2023-03-14),
6. 11476109 - Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method (2022-10-18),
7. 11456157 - Plasma processing apparatus (2022-09-27),
8. 10832892 - Antenna, plasma processing device and plasma processing method (2020-11-10),
9. 10679826 - Microwave control method (2020-06-09),
10. 10566174 - Plasma processing apparatus (2020-02-18),
11. 10504698 - Plasma processing apparatus (2019-12-10),
12. 10312057 - Plasma processing apparatus (2019-06-04),
13. 10083819 - Antenna and plasma processing apparatus (2018-09-25),
14. 10062547 - Plasma processing apparatus (2018-08-28),
15. 9970109 - Substrate processing method and substrate processing apparatus (2018-05-15),

Title: Jun Yoshikawa - Innovative Female Inventor from Miyagi, Japan

Introduction: Jun Yoshikawa is a pioneering female inventor hailing from Miyagi, Japan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jun Yoshikawa holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing her versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Jun Yoshikawa has worked with leading tech companies and research institutions, consistently pushing the boundaries of what is possible in the realm of technological advancement.

Collaborations: Throughout her career, Jun Yoshikawa has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and creativity in all her projects.

Conclusion: Jun Yoshikawa's dedication to innovation, coupled with her passion for creating a better future through technology, solidifies her status as a trailblazing inventor in the global landscape of invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…