The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Oct. 14, 2015
Tokyo Electron Limited, Tokyo, JP;
Masayuki Kohno, Austin, TX (US);
Yusuke Yoshida, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Ippei Shimizu, Miyagi, JP;
Naoki Mihara, Miyagi, JP;
Jun Yoshikawa, Miyagi, JP;
Michitaka Aita, Miyagi, JP;
Yoshikazu Azumaya, Miyagi, JP;
Junsuke Hoshiya, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a processing chamber, a table disposed in the processing chamber, a dielectric window provided at the processing chamber, and a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window. The dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween.