Company Filing History:

15 out of 10,295

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2010-2019

where 'Filed Patents' based on already Granted Patents

15 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10504698 - Plasma processing apparatus (2019-12-10),

2. 10312057 - Plasma processing apparatus (2019-06-04),

3. 9412607 - Plasma etching method (2016-08-09),

4. 9412565 - Temperature measuring method and plasma processing system (2016-08-09),

5. 8569186 - Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device (2013-10-29),

6. 8366953 - Plasma cleaning method and plasma CVD method (2013-02-05),

7. 8329596 - Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device (2012-12-11),

8. 8318614 - Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus (2012-11-27),

9. 8258571 - MOS semiconductor memory device having charge storage region formed from stack of insulating films (2012-09-04),

10. 8138103 - Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device (2012-03-20),

11. 8124484 - Forming a MOS memory device having a dielectric film laminate as a charge accumulation region (2012-02-28),

12. 8119545 - Forming a silicon nitride film by plasma CVD (2012-02-21),

13. 8114790 - Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus (2012-02-14),

14. 7771796 - Plasma processing method and film forming method (2010-08-10),

15. 7763551 - RLSA CVD deposition control using halogen gas for hydrogen scavenging (2010-07-27),

Title: Masayuki Kohno: Innovator in Plasma Processing Technology

Introduction

Masayuki Kohno is a prominent inventor based in Amagasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 15 patents. His work has advanced the technology used in various industrial applications.

Latest Patents

Kohno's latest patents include innovative designs for plasma processing apparatuses. One such apparatus is designed to supply gas into a chamber, generate plasma from the gas using electromagnetic wave power, and perform specific plasma processes on substrates held by a mounting table. This apparatus features a dielectric window that allows electromagnetic waves to propagate into the chamber, a support member for the window, and a partition member that separates the support space from the plasma generation area. Another patent describes a plasma processing apparatus that includes a processing chamber, a table, a dielectric window, and a surrounding body made of dielectric material, all working together to create an efficient processing environment.

Career Highlights

Throughout his career, Masayuki Kohno has worked with notable organizations such as Tokyo Electron Limited and Tohoku University. His experience in these institutions has allowed him to refine his expertise in plasma technology and contribute to groundbreaking innovations.

Collaborations

Kohno has collaborated with esteemed colleagues, including Toshio Nakanishi and Tatsuo Nishita. These partnerships have fostered a creative environment that has led to the development of advanced plasma processing technologies.

Conclusion

Masayuki Kohno's contributions to plasma processing technology have established him as a key figure in the field. His innovative patents and collaborations continue to influence advancements in industrial applications.

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