The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Sep. 29, 2015
Tokyo Electron Limited, Tokyo, JP;
Masayuki Kohno, Austin, TX (US);
Ryou Son, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Jun Yoshikawa, Miyagi, JP;
Michitaka Aita, Miyagi, JP;
Ippei Shimizu, Miyagi, JP;
Yusuke Yoshida, Miyagi, JP;
Koji Koyama, Miyagi, JP;
Masami Sudayama, Miyagi, JP;
Yukiyoshi Aramaki, Miyagi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.