Miyagi, Japan

Michitaka Aita

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Sendai, JP (2016)
  • Miyagi, JP (2016 - 2019)
  • Nirasaki, JP (2019 - 2020)
  • Yamanashi, JP (2020)

Company Filing History:


Years Active: 2016-2024

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11 patents (USPTO):

Title: **Innovative Contributions of Michitaka Aita in Film Formation Technologies**

Introduction

Michitaka Aita, an esteemed inventor hailing from Miyagi, Japan, has made significant strides in the field of film formation technologies. With a prolific portfolio of 11 patents, his work continues to influence advancements in materials science and engineering applications.

Latest Patents

Aita's recent innovations include two notable patents that showcase his expertise. The first is a "Film formation method and film formation device." This patent describes a method that involves adsorbing a precursor of a film-forming raw material gas onto the substrate's surface. The process utilizes ultraviolet light of a specific wavelength to separate bonds in the raw material gas while the gas is supplied into a processing container. The resulting layer is generated by a reaction between the precursor and a reaction gas on the substrate.

The second patent, "Gas distribution device and processing apparatus," features a sophisticated design that includes multiple supply lines, a branch unit, and a variation suppression unit. This setup is strategically crafted to ensure efficient gas distribution among various processing chambers, minimizing flow rate variations and enhancing the stability of the gas supply.

Career Highlights

Aita's career is closely associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics production equipment industry. His innovative mindset and technical expertise have positioned him as a vital contributor to advancing the company's technological capabilities.

Collaborations

Throughout his career, Michitaka Aita has had the privilege of collaborating with accomplished colleagues such as Naoki Matsumoto and Jun Yoshikawa. Their joint efforts have further amplified the impact of their work on film formation technologies.

Conclusion

In conclusion, Michitaka Aita's contributions to the field of film formation are commendable and reflect a deep commitment to innovation. His patents not only advance the current state of technology but also set the foundation for future research and development in the field. As he continues to innovate, Aita is poised to remain a key figure in driving technological progress.

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