The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Feb. 04, 2008
Applicants:

Kohei Kawamura, Hillsboro, OR (US);

Yasuo Kobayashi, Nirasaki, JP;

Toshihisa Nozawa, Amagasaki, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Inventors:

Kohei Kawamura, Hillsboro, OR (US);

Yasuo Kobayashi, Nirasaki, JP;

Toshihisa Nozawa, Amagasaki, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); C23C 16/513 (2006.01); H01L 21/683 (2006.01); C23C 16/458 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6831 (2013.01); C23C 16/4585 (2013.01); C23C 16/4586 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01);
Abstract

Provided is a holding stage structure which holds a substrate and disposed in a process chamber that is vacuum-evacuatable and allows a predetermined process to be performed on the substrate therein. The holding stage structure includes: a holding stage body on which the substrate is placed; an elevation pin mechanism lowering the substrate on the holding stage body or raising the substrate from the holding stage body; and a stepped portion formed on the holding stage body so that a peripheral portion of a rear surface of the substrate placed on the holding stage body is exposed to a processing gas supplied into the process chamber.


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