Location History:
- Yamanashi, JP (2007 - 2011)
- Nirasaki, JP (2005 - 2013)
- Hillsboro, OR (US) (2011 - 2019)
- Tokyo, JP (2017 - 2022)
Company Filing History:
16 out of 10,326 
5 out of 1,125 
1 out of 984 
Years Active: 2005-2022
Title: The Innovative Mind of Kohei Kawamura: Pioneering Plasma Processing Technologies
Introduction: Kohei Kawamura, based in Hillsboro, OR, has made significant contributions to the field of plasma processing through his inventive work. With an impressive portfolio of 23 patents, he has developed methods that enhance the accuracy and efficiency of plasma etching, which is crucial in semiconductor manufacturing.
Latest Patents: Among his most notable recent patents is a plasma etching method and plasma processing apparatus. This invention enables high-precision etching while controlling and reducing surface roughness in transition metal films. The method comprises a multi-step process: first, isotropically generating a layer of transition metal oxide on a film surface at a controlled low temperature. Next, the temperature is elevated while a complexation gas is applied to the oxide layer. The third step involves sublimating and removing a reaction product generated during this process, followed by cooling the sample. Another key invention is a plasma processing method for etching tungsten films, which enhances etching uniformity and process yield. This method involves forming an intermediate layer between the fluorocarbon layer and the tungsten film and subsequently removing both layers with oxygen plasma.
Career Highlights: Kawamura has a rich professional background, having worked with renowned companies such as Tokyo Electron Limited and Hitachi High-Tech Corporation, where he applied his innovative thinking to improve industrial processes. His work has led to advancements in semiconductor technology, impacting various sectors reliant on precise manufacturing techniques.
Collaborations: Throughout his career, Kohei Kawamura has collaborated with esteemed colleagues, including Hiroyuki Kobayashi and Yasuo Kobayashi. Their teamwork has fostered a shared commitment to innovation and has bolstered the advancement of plasma processing technologies.
Conclusion: Kohei Kawamura stands out as an inventive force in the field of plasma processing. His 23 patents, particularly his recent advancements in etching methodologies, reflect his dedication to precision and efficiency in semiconductor manufacturing. As technology continues to evolve, the contributions of innovators like Kawamura will undoubtedly shape the future of the industry.