The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Dec. 28, 2007
Kotaro Miyatani, Yamanashi, JP;
Kohei Kawamura, Hillsboro, OR (US);
Toshihisa Nozawa, Hyogo, JP;
Takaaki Matsuoka, Miyagi, JP;
Kotaro Miyatani, Yamanashi, JP;
Kohei Kawamura, Hillsboro, OR (US);
Toshihisa Nozawa, Hyogo, JP;
Takaaki Matsuoka, Miyagi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing method for forming a film on a substrate using a gas processed by a plasma. The plasma processing method for forming a film includes the steps of forming a CF film on the substrate by using a CFgas (here, a is a counting number, and b is a counting number which satisfies an equation of 'b=2×a−2'), processing the CF film with the gas processed by the plasma, and forming an insulating film on the CF film processed by using an insulating material processed with the plasma.