The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Feb. 12, 2016
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shigeru Kasai, Yamanashi, JP;
Kotaro Miyatani, Yamanashi, JP;
Takuya Kurotori, Tokyo, JP;
Kenichi Kote, Yamanashi, JP;
Yutaka Fujino, Yamanashi, JP;
Akira Tanihara, Yamanashi, JP;
Kohei Kawamura, Tokyo, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02345 (2013.01); H01L 21/02175 (2013.01); H01L 21/02274 (2013.01);
Abstract
In a method for forming a fluorocarbon-based insulating film to be in contact with a metal, a microwave is irradiated to the metal to which moisture is adhered in a hydrogen-containing atmosphere. Then plasma CVD using a fluorocarbon-based gas is performed on the metal to which the microwave is irradiated to form the insulating film.