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For the Inventor, By the Inventor

Nirasaki, Japan

Yutaka Fujino

This inventor holds 20 USPTO granted patents, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted, Toyko Electron Limited. Active years: 2010-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yutaka Fujino. Retrieved from https://idiyas.com/inventor/yutaka-fujino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 85.0

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Nirasaki, JP (2010 - 2024)
  • Yamanashi, JP (2016 - 2024)

Company Filing History:

goldMedal18 out of 10,904 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 103 
 
Tokyo Electron Limi Ted
 patents
bronzeMedal1 out of 13 
 
Toyko Electron Limited
 patents

Years Active: 2010-2024

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Areas of Expertise:
Plasma Treatment
Film Forming
Semiconductor Devices
Microwave Plasma
Gas Introduction
Hard Mask Film
Insulating Film
S-Parameters
Shower Plate
Threshold Control
Substrate Processing
Microwave Emission
20 patents (USPTO):Explore Patents
1. 12129544 - Cleaning method and plasma treatment device (2024-10-29),
2. 12112921 - Plasma processing method and plasma processing apparatus (2024-10-08),
3. 12077865 - Film forming method and film forming apparatus (2024-09-03),
4. 12060641 - Film forming method and film forming apparatus (2024-08-13),
5. 10879069 - Method and apparatus for forming hard mask film and method for manufacturing semiconductor devices (2020-12-29),
6. 10804078 - Plasma processing apparatus and gas introduction mechanism (2020-10-13),
7. 10557200 - Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate (2020-02-11),
8. 10211032 - Microwave plasma source and plasma processing apparatus (2019-02-19),
9. 10170347 - Substrate processing system (2019-01-01),
10. 10153169 - Method of controlling threshold of transistor and method of manufacturing semiconductor device (2018-12-11),
11. 9991097 - Plasma processing apparatus (2018-06-05),
12. 9887081 - Method for manufacturing insulating film laminated structure (2018-02-06),
13. 9702913 - Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method (2017-07-11),
14. 9663856 - Plasma processing apparatus and shower plate (2017-05-30),
15. 9640388 - Method for forming insulating film and method for manufacturing semiconductor device (2017-05-02),

Title: Yutaka Fujino: Revolutionizing Aviation with Innovative Designs

Introduction: Yutaka Fujino, a pioneering inventor hailing from Nirasaki, Japan, is renowned for his groundbreaking contributions to the field of aviation. His inventive spirit and dedication to pushing the boundaries of traditional aircraft design have earned him global recognition.

Latest Patents: Fujino's recent patents focus on advanced aerodynamic concepts and novel structural designs aimed at enhancing aircraft performance and fuel efficiency. These patents underscore his commitment to driving innovation in the aerospace industry.

Career Highlights: With a distinguished career spanning several decades, Yutaka Fujino has served in key engineering roles at leading aviation companies. His most notable achievement includes the development of the HondaJet, a cutting-edge light business jet celebrated for its innovative over-the-wing engine mount configuration.

Collaborations: Fujino has collaborated with top aerospace engineers, researchers, and industry experts to bring his visionary concepts to life. His ability to foster productive collaborations has been instrumental in realizing complex aviation projects that have redefined industry standards.

Conclusion: Yutaka Fujino's relentless pursuit of excellence and passion for reimagining aircraft design have cemented his legacy as a trailblazing inventor in the field of aviation. His innovative approach continues to inspire future generations of engineers and aviation enthusiasts worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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