The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Mar. 19, 2014
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus including a processing vesselin which a plasma process is performed and a plasma generation antennahaving a shower platewhich supplies a first gas and a second gas into the processing vessel, performs the plasma process on a substrate with plasma generated by a surface wave formed on a surface of the shower platethrough a supply of a microwave. The shower platehas multiple gas holesconfigured to supply the first gas into the processing vesseland multiple supply nozzlesconfigured to supply the second gas into the processing vessel, and the supply nozzlesare protruded vertically downwards from a bottom surface of the shower plateand are provided at different positions from the gas holes